UV lithography is performed using a Karl Süss MJB 4 mask aligner. The MJB 4 is equipped with a 350W high-pressure mercury-vapor lamp, facilitating exposure at 365 nm and 405 nm.
Largest applicable masks are 5" × 5" resulting in sample sizes of at most 4" × 4". The uniformity of illumination over the 4" area is ±2%.
An XYΘ-table enables horizontal displacements and rotation with micrometer screws. The optical alignment is handled from top side. The MJB 4 offers vacuum as well as hard and soft contact mode.
Reference: Karl Süss KG, KSM-MJB 3 Anleitung 401, 1982.
short overview of optical lithography (german)
Danke! Diese Video wurde vom "Medienlabor AG Medienwissenschaft/Kamera und Schnitt: Lukas Burg" im Rahmen einer Webdokumentation zum 50jährigen Bestehen der Universität Konstanz erstellt.