To deposit photo resists, the Nanolab is equipped with a solar-semi EL S 200 BM spin-coating module. The coater can handle
- wafers up to 8" or
- samples up to 6" × 6".
Process step times range from 0.5 s to 999.9 s. The speed as well as the the acceleration of the rotary plate are freely programmable:
- speed starting at 100 rpm up to 6000 rpm and
- acceleration starting at 1 rpm/s up to 6000 rpm/s.
In total, 40 recipes with 8 steps each can be saved on the internal memory.
Reference: solar-semi GmbH, SO661 easyline, 2014.