RTA sample holder in front of the heating chamber carrying a wafer; Copyright: Gillian Kiliani

The RTP-1200-100, manufactured by UniTemp GmbH, is a rapid thermal annealing oven. It is capable of precise, reproducible and fast heating under vacuum conditions down to 10-5 mbar or specific atmospheres, such as nitrogen and oxygen.

The quartz sample holder has a height of 10 mm and accomodates samples or wafers of a diameter up to 4".

A maximum temperature of 1200 °C can be achieved by top and bottom heating with 18 infrared lamps (total power consumption 18 kW). Top and bottom heating are individually controllable. Heating rates of up to 150 K/s and cooling rates of up to −200 K/min for initial temperatures of 400 °C to 1200 °C and up to −30 K/min for initial temperatures of 100 °C to 400 °C are possible.

The internal memory can store a total of 20 individual recipies. The number of recipies storable when using the computer interface is unlimited.

Reference: UniTemp GmbH, Betriebsanleitung RTP-1200-100 Rapid Thermal Process Oven, 2009